Mitsubishi Electric Achieves World’s First Demonstration of Suppression of Frequency Dispersion in GaN Transistors Using GaN Substrates

TOKYO–(BUSINESS WIRE)–Mitsubishi Electric Corporation (TOKYO: 6503) announced today that it has, for the first time in the world, elucidated the effects of frequency dispersion caused by crystal defects in a gallium nitride (GaN) transistor, a high-frequency transistor fabricated by depositing a GaN epitaxial layer on a GaN substrate, and demonstrated that frequency dispersion can be significantly suppressed. This achievement makes it possible to consistently realize the inherently high perfo

Privacy Overview

This website uses cookies so that we can provide you with the best user experience possible. Cookie information is stored in your browser and performs functions such as recognising you when you return to our website and helping our team to understand which sections of the website you find most interesting and useful.